Silicon nitride TEM grids

3 mm TEM grids with a scaffolded silicon nitride membrane, offering the image quality of a thin membrane with the durability of a thicker membrane.

Features:

  • Compatible with standard TEM holders.
    • 3 mm diameter, 250 μm height
  • Silicon nitride membranes having
    • 20 nm imaging regions for low background,
    • 200 nm scaffolds for high durability,
    • A large imaging area (800x800 μm),
      • Requiring less precision when depositing samples.
  • Clear labeling
    • Each imaging region has coordinate labels that
      • Are visible both optically and via TEM, and
      • Lack mirror symmetry, making it easy to determine grid orientation under TEM.
    • Each grid has a large 2-digit unique sample label, visible without a microscope.
  • We offer grids with a variety of hole sizes:
    • 1 μm
    • 2 μm
    • Variety-grid: 0.5-32 μm on a single grid.