3 mm TEM grids with 500 nm holes in a silicon nitride membrane. The membrane features imaging regions with a 20 nm-thick membrane, supported by a 200 nm-thick scaffold, for a large imaging area with low background and high durability.
Each membrane is uniquely labeled with its coordinates, for ease of finding and recording sample location, and each grid has a large, unique, two digit ID, visible without a microscope to easily distinguish samples.
