3 mm TEM grids with 1 um holes (separated by 1 um) in a silicon nitride membrane. The membrane features imaging regions with a 20 nm membrane, supported by 200 nm scaffold, offering the image quality of a thin membrane with the durability of a thicker membrane.
Each membrane is uniquely labeled with its coordinates, for ease of finding and recording sample location, and each grid has a large, unique, two digit ID, visible without a microscope to easily distinguish samples.
