Collection: In-situ TEM grids

In-situ grids enable electrical transport measurements to be performed simultaneously with TEM imaging.

There are a few grid designs for compatibility with a few different TEM grid holders (see individual product pages).

Features:

• Compatible with a few specialized TEM holders
• Three “device regions” having
  • Three electrode widths: 0.5, 1, 2 μm to fit a variety of sample sizes
  • Electrodes are gold
    • Low oxidation
    • 25 nm height provides a relatively flat surface (useful for 2D materials)
  • A thin ~20 nm nitride membrane for low-background imaging
  • Holes/slots for background-free imaging
  • Slots to allow for imaging at high tilt angle
• Bulk of the membrane is 160 nm for
  • Greater durability when depositing samples
  • Greater rigidity when imaging
• Pt ring electrodes* allow
  • Heating the membrane
    • Note: Gold can migrate at high temperatures, so grids may not be suitable for experiments over 400C
  • Measuring membrane temperature (via changes in resistance of the 200 Ω ring)
• 4 alignment marks for custom lithography or aligned sample deposition (80 μm spacing)
• Unique device labels readable without a microscope